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We propose one possible manufacturing pathway for realizing nanodevice based computational fabrics that combines self-assembly based techniques with conventional photolithography. This pathway focuses on realizing the fabric as a whole including assembly of nanostructures, functionalization of devices, contacts and interconnects. Furthermore, this pathway is scalable to large systems, as multiple devices are created simultaneously in a self-aligning process step. We discuss the key sequence of steps for achieving nanoscale computational systems using the example of a simple digital logic circuit, and review the associated challenges involved for each of these.