3-D Integrated Nanowire Fabric beyond CMOS

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The research on 3-D integrated nanowire fabric focuses on transformative new ways to integrate novel devices and structures in vertical nanowires to achieve functional circuits, while maintaining manufacturability; in this fabric, features are architected to solve circuit, connectivity and thermal management issues in an integrated manner. Currently, the research details and outcomes are pending publications; more details will be coming soon.

Acknowledgements: This project is sponsored by NSF grant CCF-1407906 and the Center for Hierarchical Manufacturing (CHM, NSF DMI-0531171).