IEEE International Nanoelectronics Conference (INEC)

NASICs: A Nanoscale Fabric for Nanoscale Microprocessors

The rapid progress of manufacturing nanoscale devices is pushing researchers toexplore appropriate nanoscale computing architectures for high density beyond the physical limitations of conventional lithography. However, manufacturing and layout constraints, as well as high defect/fault rates expected in nanoscale fabrics, could make most device density lost whenintegrated into computing systems. Therefore, a nanoscale architecture that can deal with those constraints and tolerate defects/faults at expected rates, while still retaining the density advantage, is highly desirable.

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