The University of Massachusetts Amherst

R2R Spatial Atomic Layer Deposition

R2R-SALD provides a unique capability for high quality coatings on a moving web. Benefits of SALD include;

  • Gas flow are typically continuous (no valving)
  • Moving substrates
  • Substrate moves through reactant or purge “zone”
  • Portion of substrate surface reacted on each cycle
  • No deposition outside of desired deposition region
  • Atmospheric pressure processes
  • Short gas exposure times
  • Process times limited by kinetics and substrate handling

  • Small gap → Substrate floats (gas bearing)
  • High pressure to drive from source to exhaust: Good Isolation
  • Excellent control of substrate position
  • Very small “chamber”

Specs for Linear (left) or drum (right) head designs are presently being considered from different vendors for immediate procurement.

Reference: Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition P. Poodt, et al. J. Vac. Sci. Technol. A 30, 010802 (2012); http://dx.doi.org/10.1116/1.3670745