R2R Spatial Atomic Layer Deposition
R2R-SALD provides a unique capability for high quality coatings on a moving web. Benefits of SALD include;
- Gas flow are typically continuous (no valving)
- Moving substrates
- Substrate moves through reactant or purge “zone”
- Portion of substrate surface reacted on each cycle
- No deposition outside of desired deposition region
- Atmospheric pressure processes
- Short gas exposure times
- Process times limited by kinetics and substrate handling
- Small gap → Substrate floats (gas bearing)
- High pressure to drive from source to exhaust: Good Isolation
- Excellent control of substrate position
- Very small “chamber”
Specs for Linear (left) or drum (right) head designs are presently being considered from different vendors for immediate procurement.
Reference: Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition P. Poodt, et al. J. Vac. Sci. Technol. A 30, 010802 (2012); http://dx.doi.org/10.1116/1.3670745
