The University of Massachusetts Amherst

R2R Nanoimprint Lithography

The R2R NanoImprint tool provides a unique suite of capabilities enabling innovative process development including patterning across multiple length-scales, and direct printing of a range of materials compositions.

  • Next Generation Tool Based on Nano Emboss 100 Platform
  • Adds Thermal Imprint, Solvent Assisted, Soft and Optical Contact Lithography
  • Equipped with NIR Anneal
  • Enables Direct Printing of Metal Oxides