Nanonex NX-2608BA
The Nanonex Nanoimprint Lithography Tool provides state-of-the-art capability for patterning, alignment, and direct printing of multiple materials for printed electronics. The sheet-printing capability provides unprecedented pattering of critical features and aligment resolution.
Key Features
All forms of Nanoimprint
- Thermoplastic
- Photocurable
- Simultaneous thermal and UV NIL
- Air Cushion Press (ACP) technology provides excellent uniformity over entire substrate
- High Throughput
- Sub 10 nm imprint resolution
- Sub-1 µm Overlay alignment frontside and optional backside alignment
- Smart sample holder
- Substrate size – up to 8 inch wafers
- Temperature range of 0 to 250°C
- Pressure range of 0 to 500 psi
- 200W Narrow band UV lamp
- Automatic control
- Alignment
- X, Y, Z, Theta Stage
- Split Field Optics and CCD Camera
- Photolithography
- 5 inch mask standard
- UV source 500 W Mercury lamp
- User friendly control software
