The Nanonex Nanoimprint Lithography Tool provides state-of-the-art capability for patterning, alignment, and direct printing of multiple materials for printed electronics. The sheet-printing capability provides unprecedented pattering of critical features and aligment resolution.

Key Features
All forms of Nanoimprint

• Thermoplastic
• Photocurable
• Simultaneous thermal and UV NIL
• Air Cushion Press (ACP) technology provides excellent uniformity over entire substrate
• High Throughput
• Sub 10 nm imprint resolution
• Sub-1 µm Overlay alignment frontside and optional backside alignment
• Smart sample holder
• Substrate size – up to 8 inch wafers
• Temperature range of 0 to 250°C
• Pressure range of 0 to 500 psi
• 200W Narrow band UV lamp
• Automatic control
• Alignment
  • X, Y, Z, Theta Stage
  • Split Field Optics and CCD Camera
• Photolithography
  • 5 inch mask standard
  • UV source 500 W Mercury lamp
• User friendly control software

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