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Nanonex NX-2608BA

The Nanonex Nanoimprint Lithography Tool provides state-of-the-art capability for patterning, alignment, and direct printing of multiple materials for printed electronics. The sheet-printing capability provides unprecedented pattering of critical features and aligment resolution.

Key Features
All forms of Nanoimprint

  • Thermoplastic
  • Photocurable
  • Simultaneous thermal and UV NIL
  • Air Cushion Press (ACP) technology provides excellent uniformity over entire substrate
  • High Throughput
  • Sub 10 nm imprint resolution
  • Sub-1 µm Overlay alignment frontside and optional backside alignment
  • Smart sample holder
  • Substrate size – up to 8 inch wafers
  • Temperature range of 0 to 250°C
  • Pressure range of 0 to 500 psi
  • 200W Narrow band UV lamp
  • Automatic control
  • Alignment
    • X, Y, Z, Theta Stage
    • Split Field Optics and CCD Camera
  • Photolithography
    • 5 inch mask standard
    • UV source 500 W Mercury lamp
  • User friendly control software
 Nanonex NX-2608BA