Roll-to-Roll Fabrication and Processing Facility
The R2R Nano Lab provides a unique set of custom, moving web-based tools for the translation of advanced materials and nanomanufacturing processes to industrially relevant scalable platforms for the development of next generation life science innovations in biosensors, diagnostics, and platforms for personalized health monitoring. Custom R2R coating, lithography and printing tools (inkjet, aerosol jet, nano-emboss, photonic cure, atomic layer deposition (ALD)) utilizing nanomaterials advances for precision patterning and integration of novel compositional coatings having unprecedented functionalities will impact specified applications in biosensing, printed electronics, microfluidics, detection and monitoring of disease, and control of electro-magneto-optical imaging and detection systems. Combined with additional web-based tools for vacuum sputter deposition, reactive ion etching, wet chemistry, and interlayer alignment, the R2R Nano Lab provides access to an emerging set of tools found nowhere else.
Mission
Our mission is to enable the development of next-generation continuous large area manufacturing through the translation of advanced materials and nanofabrication processes to flexible, web-based tool sets. This combination of functionalized nanomaterials, patterning and alignment across multiple length-scales, and innovative integration strategies provides the necessary platform for industry adoption of these emerging technologies for future applications for flexible hybrid electronics including smart sensors, wearables, energy, and medical devices.
Roll to Roll Clean Room Labs
Dry and Wet labs enables process development under controlled environments for repeatable, reliable results. Dry room space further enable advanced materials development for applications such as batteries where moisture can cause detrimental outcomes.
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AJA R2R Sputtering System
The AJA sputter deposition tool provides industry standard vacuum deposition capability for a range of metals, dielectrics, and magnetic materials.
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Adphos Near IR 126-125 Drying / Sintering
Wavelength: Peak in Near IR, extend to visible & IR -
Besi Datacon 2200 Evo Plus R2R Pick and Place/Bonding Tool for Hybrid Integration
The web-based pick and place/die attach tool provides users with an advanced capability to develop methods for flexible-hybrid electronic circuit integration and system prototyping.
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Dimatix DMP 2831
The web-based pick and place/die attach tool provides users with an advanced capability to develop methods for flexible-hybrid electronic circuit integration and system prototyping.
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Frontier Coater
The Frontier coater is a versatile tool enabling solution-based coatings over a range of viscosity and thicknesses for the development of advanced coatings.
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LSL Dry Room
Dry and Wet labs enable process development under controlled environments for repeatable, reliable results.
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Nanocoater 100
The Nanocoater is a versatile tool enabling solution-based coatings over a range of viscosity and thicknesses. -
Nanonex NX-2608BA
The Nanonex Nanoimprint Lithography Tool provides state-of-the-art capability for patterning, alignment, and direct printing of multiple materials for printed electronics.
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Optomec Aerosol Jet 300
Additive 3D printing capabilities include both Aerosol Jet and Inkjet platforms providing versatility in terms of materials and inks available, range of viscosity, and post deposition cure by UV or IR photonic cure.
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Pro-Lam 1200 Lab Scale Laminator/Slitter
Lamination Widths: 4” -12” -
PulseForge 1300 Photonic Sintering
Wavelength: Peak in Visible, extend to UV & IR -
R2R In-Line 1 Micron Layer-to-Layer Alignment
UMass is developing a R2R system for lithographic exposure and alignment to embossed features utilizing interferometric detection of patterned target structures, subsequently aligning and exposing a pattern to those features.
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R2R Nanoimprint Lithography
The R2R NanoImprint tool provides a unique suite of capabilities enabling innovative process development including patterning across multiple length-scales, and direct printing of a range of materials compositions.
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R2R Spatial Atomic Layer Deposition
R2R-SALD provides a unique capability for high quality coatings on a moving web. -
R2R Test Frame for New Process Development
Roll to roll test frame to support the development of R2R processes and integration equipment in a modular, reconfigurable way. -
R2R UV-NIL Tool
UMass NANOemBOSS R2RNIL constructed with Carpe Diem Technologies. -
R2R Xaar Inkjet Printer with in-line Near IR and Photonic Pulse Curing Stations
This custom R2R tool provides state-of-the-art capability for development of advanced materials and inks for emerging printed electronic applications.
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Trion R2R DRIE & IBM System
The Trion Deep Reactive Ion and Ion Beam Etcher provides vacuum-based dry etch capability compatible with several substrates (plastic, glass, metal foil).
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UMass Slitter/Laminator
This custom built atmospheric slitter/laminator tool enables final sizing, slitting and lamination steps to be completed for prototyping and test.
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Yasui Seiki Mini-Labo
Yasui Seiki Mini-Labo microgravure tool for coating development on 4” webs.
