Nanoimprint lithography (NIL) is a new way of nanopatterning and a revolutionary solution to nanomanufacturing. NIL patterns nanostructures by the physical deformation of a deformable material using a mold. NIL can have sub-5 nm resolution and 1% CD control, and simultaneously achieve high-throughput, sub-10 nm structures and low cost -- a feat currently impossible using other existing lithographic methods.
Conte Center for Polymer Research
The Nanonex NX-2000 is a single wafer nanoimprinter for all forms of imprint (e.g. thermal, photo-curable, and embossing) without alignment. The tool offers excellent uniformity regardless of the roughness of the backside of the substrate and mold, minimum relative lateral shift between the wafer and mold, very small thermal mass and hence rapid heating and cooling time.
Natural Sciences and Mathematics
Polymer Science and Engineering