Julie Leiston-Belanger, a student in the Polymer Science and Engineering Department, has been awarded an IBM Ph.D. Fellowship by IBM Corporation.
The award provides a $17,500 stipend as well as tuition and academic fees for one year, with the opportunity for renewal for a total of three years. It also includes the opportunity for a summer project with IBM under the mentorship of a senior member of IBM’s research community.
“This highly competitive award recognizes exemplary scholarship and research potential in a limited number of doctoral students each year, so we were extremely pleased to hear that Julie is receiving this fellowship,” said professor Thomas Russell, who nominated Leiston-Belanger on behalf of the University. She was one of 40 recipients out of 400 nominations submitted, and the only polymer science student selected for this year’s IBM Fellowship program.
A native of Spencerport, N.Y., Leiston-Belanger is focusing on nanoporous templating of diblock copolymers. Advanced nanoscale processing of polymers is contributing to breakthroughs in the development of new lithographic techniques for manufacturing semiconductors.