UMass Amherst

Seshu B. Desu

Professor, Dept. of Electrical and Computer Engineering
Marcus Hall, University of Massachusetts
Amherst, MA 01003-9292
(413) 577-0927
sdesu@ecs.umass.edu
http://www.ecs.umass.edu/ece/gradfac/desu.html

Emerging electronic devices and Novel processes for nano-and bio-devices

Our research interests include: (a) electronic materials for advanced semiconductor devices, (b) novel processes for sub-micron devices, and (c) structure-property relations in thin films. Affiliated with the Thin Films Laboratory and Organic Electronics Laboratory at UMass Amherst.

Research Interest Potential Application
Nanocomposites and Low-K materials Reduce delays in integrated circuits in computers
Organic Electronics Advanced semiconductor applications and bio-device applications
Thin films technology Solar cells, coatings

Honors and Awards

  • Alumni Award for Research Excellence, 1998
  • Dean's Award for Research Excellence, 1998
  • Principal Editor, Journal of Materials Research, 1994
  • Dean's Awards for Teaching Excellence, 1991, 1994 and 1997
  • Fellow, American Ceramic Society

Publications

  1. S.B. Desu, R. Vedula, H.D. Bhatt, et al. “Novel electrode barriers for high density ferroelectric nonvolatile memories,” Phys Status Solidi A 184 (2): 273-289, (2001).
  2. R. Vedula. S. Kaza, S.B. Desu, Chemical Vapor Deposition of Polymers: Principles, Materials and Applications, Surface Sci.& Eng.Ser.2, 2001, Ed. J Park and T. Sudarshan.
  3. S. Tirumala , A.C. Rastogi  and S.B. Desu, “Effect of oxygen plasma on growth, structure and ferroelectric properties of SrBi2Ta2O9 thin films formed by pulsed laser ablation technique,”  J Electroceram 5: (1) 7-20,  (2000).
  4. J. J. Senkevich, S.B. Desu and V. Simkovic, “Temperature studies of optical birefringence and X-ray diffraction with poly(p-xylylene), poly(chloro-p-xylylene) and poly(tetrafluoro-p-xylylene) CVD thin films,” POLYMER 41: (7) 2379-2390, (2000).
  5. S. B. Desu and O. G. Vendik, “Suppression of size effects in ferroelectric films,” Integrated Ferroelectrics 29: (1-2) 175-192, (2000).